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Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Type:
Journal
Info:
Wear 523 (2023) 204731
Date:
2022-11-17
Author Information
| Name | Institution |
|---|---|
| Kylie E. Van Meter | Florida State University |
| Md. Istiaque Chowdhury | Lehigh University |
| Mark J. Sowa | Veeco Instruments |
| Alexander Campbell Kozen | University of Maryland |
| Tomas Grejtak | Florida State University |
| Tomas F. Babuska | Florida State University |
| Nicholas C. Strandwitz | Lehigh University |
| Brandon A. Krick | Florida State University |
Films
Plasma TiVN
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 3275-24-9
CAS#: 19824-56-7
CAS#: 7727-37-9
Film/Plasma Properties
Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test
Characteristic: Wear Rate
Analysis: Reciprocating Sliding Test
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Stress
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Density
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Substrates
| Si with native oxide |
| SiO2 |
Notes
| 1694 |