About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Advanced Search of the Plasma Enhanced Atomic Layer Deposition Publication Database

The relevant plasma atomic layer deposition literature is spread out over the last 20 years in numerous journals and conference proceedings. Here is provided an easy interface to quickly search for journal articles and other types of scientific publications relevant to your plasma ALD research needs.

We have prescreened plasma ALD references, according to 9 categories, to help you quickly find the information you need. Use the drop down selector boxes for each category to specify one or more categories. After you have set the drop down boxes, press the "Submit" button to retreive the results.

Overspecifying the search may not return any results. Start with a single search term and if you get too many matches, return to this page and specify another category to narrow the results.

Film Composition and Substrates

Process Chemistries and Hardware

Authors and Affiliations

Film and Plasma Characteristics, Analyses, and Diagnostics

Temperature Range