Mark Sowa, owner of Plasma ALD, LLC and operator of www.plasma-ald.com, has over 30 years experience of plasma-based thin film processing experience.
Ph.D. Chemical Engineering, Princeton University, Dissertation: Mechanism for the Selective Etch of Silicon Dioxide in a High-Density, Low-Pressure Inductively Coupled Fluorocarbon Plasma
Postdoctoral Appointee, Sandia National Laboratory, Microelectronics Development Laboratory
Development Associate, Praxair, Electronic Materials
Senior/Staff Research Scientist, Cambridge NanoTech, Ultratech, Veeco
Mark's focus has been on plasma enhanced atomic layer deposition (PEALD) as the lead scientist on the Fiji PEALD system from its 2008 introduction at Cambridge NanoTech, through its years at Ultratech(2013-2017), and continued to Spring 2025 at Veeco.
Over those 16+ years, 100's of Fijis were delivered to universities, government laboratories, and industrial customers world wide. Everyday Mark would provide ongoing support to those customers in the form of:
On-site hardware installations
On-site training
Identification of best (PE)ALD materials and processes for specific applications
Deposition requirements
Required hardware configurations
Optimized process recipes
Process integration
Process troubleshooting
Hardware troubleshooting
Mark's expertise extends to applications adjacent to PEALD as well, including: