Publication Information

Title: Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films

Type: Journal

Info: Electrochemical and Solid-State Letters, 15 (2) G1-G3 (2011)

Date: 2011-11-10

DOI: http://dx.doi.org/10.1149/2.024202esl

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma TiO2 using Custom ICP

Deposition Temperature Range = 100-300C

0-0-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Ion Energy

RFEA, Retarding Field Energy Analyzer

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Substrates

Si(100)

Keywords

Substrate Biasing

Notes

669

Disclaimer

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