| 1 | An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor |
| 2 | Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition |
| 3 | Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy |
| 4 | Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization |
| 5 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
| 6 | Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition |
| 7 | Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing |
| 8 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
| 9 | Interfaces Formed by ALD Metal Oxide Growth on Metal Layers |
| 10 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
| 11 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 12 | Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors |
| 13 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
| 14 | Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer |
| 15 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
| 16 | Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters |
| 17 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
| 18 | Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy |
| 19 | Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor |
| 20 | Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide |
| 21 | Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode |
| 22 | A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects |
| 23 | Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition |
| 24 | Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method |
| 25 | Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers |
| 26 | Epitaxial 1D electron transport layers for high-performance perovskite solar cells |
| 27 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
| 28 | Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films |
| 29 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 30 | New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers |
| 31 | Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting |
| 32 | Protective capping and surface passivation of III-V nanowires by atomic layer deposition |
| 33 | Study on the resistive switching time of TiO2 thin films |
| 34 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
| 35 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
| 36 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
| 37 | Biofilm prevention on cochlear implants |
| 38 | Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy |
| 39 | Bipolar resistive switching in amorphous titanium oxide thin film |
| 40 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 41 | Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications |
| 42 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
| 43 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
| 44 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
| 45 | Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition |
| 46 | Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices |
| 47 | On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies |
| 48 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
| 49 | Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features |
| 50 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 51 | Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films |
| 52 | Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films |
| 53 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
| 54 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
| 55 | Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition |
| 56 | The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain |
| 57 | Breakdown and Protection of ALD Moisture Barrier Thin Films |
| 58 | Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma |
| 59 | Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination |
| 60 | Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition |
| 61 | Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays |
| 62 | Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance |
| 63 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
| 64 | Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application |
| 65 | Flexible Memristive Memory Array on Plastic Substrates |
| 66 | Oxygen migration in TiO2-based higher-k gate stacks |
| 67 | Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells |
| 68 | Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 |
| 69 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
| 70 | Highly reflective polymeric substrates functionalized utilizing atomic layer deposition |
| 71 | Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications |
| 72 | Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates |
| 73 | Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2 |
| 74 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
| 75 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 76 | Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition |
| 77 | Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation |
| 78 | Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition |
| 79 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 80 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 81 | X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect |
| 82 | Lithium-Iron (III) Fluoride Battery with Double Surface Protection |
| 83 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
| 84 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 85 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 86 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
| 87 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
| 88 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
| 89 | Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma |
| 90 | Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors |
| 91 | Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C |
| 92 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
| 93 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 94 | Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors |
| 95 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 96 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
| 97 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
| 98 | Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition |
| 99 | Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings |
| 100 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
| 101 | The role of plasma in plasma-enhanced atomic layer deposition of crystalline films |
| 102 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
| 103 | Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor |
| 104 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
| 105 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 106 | Highly efficient and bending durable perovskite solar cells: toward a wearable power source |
| 107 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
| 108 | Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions |
| 109 | Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer |
| 110 | Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition |
| 111 | Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source |
| 112 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
| 113 | Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition |
| 114 | Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications |
| 115 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
| 116 | Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions |
| 117 | Room temperature atomic layer deposition of TiO2 on gold nanoparticles |
| 118 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
| 119 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
| 120 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
| 121 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
| 122 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 123 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
| 124 | Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition |
| 125 | Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability |
| 126 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 127 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
| 128 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
| 129 | Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method |
| 130 | High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films |
| 131 | Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide |
| 132 | Opportunities of Atomic Layer Deposition for Perovskite Solar Cells |
| 133 | Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors |
| 134 | The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
| 135 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 136 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 137 | Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy |
| 138 | Impact of interface materials on side permeation in indirect encapsulation of organic electronics |
| 139 | High-efficiency embedded transmission grating |
| 140 | Plasma Enhanced Atomic Layer Deposition on Powders |
| 141 | Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination |
| 142 | Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors |
| 143 | Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition |
| 144 | Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support |
| 145 | 3D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research |
| 146 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth |
| 147 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 148 | Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics |
| 149 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 150 | Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes |
| 151 | Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition |
| 152 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
| 153 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
| 154 | Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites |
| 155 | Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition |
| 156 | Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques |
| 157 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
| 158 | Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition |
| 159 | The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells |
| 160 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 161 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
| 162 | Transient characterization of the electroforming process in TiO2 based resistive switching devices |
| 163 | Atomic structure of conducting nanofilaments in TiO2 resistive switching memory |
| 164 | Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches |
| 165 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
| 166 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
| 167 | Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme |
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