Publication Information

Title: Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

Type: Journal

Info: Thin Solid Films 518 (2010) 4757 - 4761

Date: 2010-01-12

DOI: http://dx.doi.org/10.1016/j.tsf.2010.01.015

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

POSCO

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Yonsei University

Films

Plasma TiO2 using Custom ICP

Deposition Temperature Range = 200-300C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam VASE

Thickness

TEM, Transmission Electron Microscope

JEOL 2100F

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku D/Max-1400

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Photocatalytic Activity

Contact Angle Measurement

Unknown

Photocatalytic Activity

Organic Compound Decomposition

Unknown

Substrates

Zn

Keywords

Photocatalyst

Notes

728

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