Publication Information

Title: Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 01A114 (2016)

Date: 2015-10-19

DOI: http://dx.doi.org/10.1116/1.4935337

Author Information

Name

Institution

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

University of Wuppertal

Films

Plasma Al2O3 using Custom

Deposition Temperature = 80C

75-24-1

7782-44-7

Thermal Al2O3 using Beneq TFS-200

Deposition Temperature Range N/A

Thermal TiO2 using Beneq TFS-200

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Thickness

Profilometry

Dektak

Refractive Index

Ellipsometry

J.A. Woollam M-2000V

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Substrates

Silicon

ITO

Keywords

Notes

405

Disclaimer

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