Custom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom hardware returned 142 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
3Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
4Atmospheric pressure plasma enhanced spatial ALD of silver
5Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
6Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
7Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
8Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
9Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
10Atomic layer deposition of titanium nitride from TDMAT precursor
11Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
12Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
13Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
14Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
15Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
16Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
17Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
18Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
19Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
20Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
21Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
22Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
23Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
24Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
25Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
26Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
27Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
28Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
29Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
30Designing high performance precursors for atomic layer deposition of silicon oxide
31Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
32Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
33Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
34Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
35Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
36Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
37Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
38Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
39Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
40Encapsulation method for atom probe tomography analysis of nanoparticles
41Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
42Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
43Fast PEALD ZnO Thin-Film Transistor Circuits
44Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
45Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
46Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
47Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
48Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
49Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
50High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
51Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
52Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
53Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
54Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
55In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
56In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
57In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
58Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
59Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
60Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
61Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
62Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
63Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
64Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
65Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
66Low-Power Double-Gate ZnO TFT Active Rectifier
67Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
68Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
69Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
70Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
71Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
72Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
73Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
74Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
75Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
76Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
77Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
78Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
79Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
80Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
81Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
82Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
83Optical and Electrical Properties of AlxTi1-xO Films
84Optical and Electrical Properties of TixSi1-xOy Films
85Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
86Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
87Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
88Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
89Patterned deposition by plasma enhanced spatial atomic layer deposition
90PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
91Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
92Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
93Plasma enhanced atomic layer deposition of Fe2O3 thin films
94Plasma enhanced atomic layer deposition of Ga2O3 thin films
95Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
96Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
97Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
98Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
99Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
100Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
101Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
102Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
103Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
104Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
105Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
106Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
107Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
108Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
109Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
110Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
111Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
112Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
113Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride
114Remote Plasma ALD of Platinum and Platinum Oxide Films
115Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
116Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
117Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
118Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
119Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
120Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
121Room temperature atomic layer deposition of TiO2 on gold nanoparticles
122Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
123Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
124RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
125RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
126Ru thin film grown on TaN by plasma enhanced atomic layer deposition
127Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
128Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
129Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
130Study on the characteristics of aluminum thin films prepared by atomic layer deposition
131Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
132Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
133Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
134Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
135The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
136The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
137Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
138Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
139Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
140Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
141Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
142Very high frequency plasma reactant for atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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