Publication Information

Title: Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System

Type: Journal

Info: Science of Advanced Materials, Volume 8, Number 4 2016, pp. 872-877

Date: 2016-04-01

DOI: https://doi.org/10.1166/sam.2016.2547

Author Information

Name

Institution

Kwangwoon University

Kwangwoon University

Kwangwoon University

Kwangwoon University

Kwangwoon University

Films

Plasma SiO2 using Custom

Deposition Temperature Range = 50-400C

27804-64-4

7782-44-7

Plasma SiON using Custom

Deposition Temperature Range N/A

27804-64-4

7782-44-7

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Wet Etch Resistance

Wet Etch

Custom

Conformality, Step Coverage

Unknown

Unknown

Images

TEM, Transmission Electron Microscope

Unknown

Interfacial Layer

TEM, Transmission Electron Microscope

Unknown

Morphology, Roughness, Topography

Unknown

Unknown

Substrates

Keywords

Notes

Used conference abstract for some additional info.

891

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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