Publication Information

Title: Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation

Type: Journal

Info: Thin Solid Films 552 (2014) 155 - 158

Date: 2013-12-04

DOI: http://dx.doi.org/10.1016/j.tsf.2013.12.003

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Films

Deposition Temperature Range = 40-100C

75-24-1

7782-44-7

Deposition Temperature Range = 40-100C

3275-24-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Water Vapor Transmission Rate (WVTR)

Water Vapor Transmission Rate (WVTR)

Mocon PERMATRAN-W Model 3/33

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Unknown

Bending Test, Four Point Bend Delamination Test

Unknown

Water Vapor Transmission Rate (WVTR)

OLED Illumination

JBS International IVL300

Substrates

PES, Poly(Ether Sulfone)

Keywords

Diffusion Barrier

Notes

568

Disclaimer

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