HfSiOx Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfSiOx films returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Annealing behavior of ferroelectric Si-doped HfO2 thin films
2Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
3Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
4High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
5Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
6Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
7Optical properties and bandgap evolution of ALD HfSiOx films
8TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
9The effects of layering in ferroelectric Si-doped HfO2 thin films


I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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