Publication Information

Title: Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration

Type: Journal

Info: Journal of Vacuum Science & Technology B 34, 051807 (2016)

Date: 2016-08-25

DOI: http://dx.doi.org/10.1116/1.4962322

Author Information

Name

Institution

Grenoble Alps University (UGA)

Grenoble Alps University (UGA)

Grenoble Alps University (UGA)

CEA - Grenoble

CEA - Grenoble

Films

Plasma SiO2 using ASM EmerALD

Deposition Temperature = 50C

27804-64-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Photoresist

TOK CAP64, Positive Chemically Amplified Photoresist

ARC, Antireflective Coating

Keywords

Notes

906

Disclaimer

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