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Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Nanomaterials 2023, 13, 161
Date:
2022-12-27
Author Information
| Name | Institution |
|---|---|
| Boyun Choi | Chungnam National University |
| Hyeong-U Kim | Korea Institute of Machinery and Materials |
| Nari Jeon | Chungnam National University |
Films
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Ion Density
Analysis: -
Characteristic: Ion Flux
Analysis: -
Characteristic: Electron Temperature, Te
Analysis: -
Substrates
| Si(100) |
| TiN |
| ITO |
Notes
| nice plot of thermal and plasma ALD HfO2 roughness vs deposition temperature data from several papers for TDMAH and TEMAH |
| 1657 |