Publication Information

Title: Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation

Type: Journal

Info: RSC Adv., 2016, 6, 97720-97727

Date: 2016-09-26

DOI: http://dx.doi.org/10.1039/C6RA19442G

Author Information

Name

Institution

CSIR-National Physical Laboratory (CSIR-NPL)

CSIR-National Physical Laboratory (CSIR-NPL)

CSIR-National Physical Laboratory (CSIR-NPL)

CSIR-National Physical Laboratory (CSIR-NPL)

Films

Plasma HfO2 using Picosun R200

Deposition Temperature Range N/A

352535-01-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Recombination Velocity

Unknown

Unknown

Effective Charge Density

C-V, Capacitance-Voltage Measurements

Unknown

Interface Trap Density

C-V, Capacitance-Voltage Measurements

Unknown

Substrates

Silicon

Keywords

Passivation

Notes

958

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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