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Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
Type:
Journal
Info:
J. Vac. Sci. Technol. B, Vol. 24, No. 5, Sep/Oct 2006
Date:
2006-08-01
Author Information
| Name | Institution |
|---|---|
| Wan Joo Maeng | Pohang University of Science and Technology (POSTECH) |
| Sang-Joon Park | Pohang University of Science and Technology (POSTECH) |
| Hyungjun Kim | Pohang University of Science and Technology (POSTECH) |
Films
Plasma Ta2O5
Thermal Ta2O5
Thermal TaNx
Plasma TaNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
Notes
| 1164 |