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Publication Information

Title: Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

Type: Conference Proceedings

Info: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment Volume 831, 2016, Pages 2 - 6

Date: 2016-03-11

DOI: http://dx.doi.org/10.1016/j.nima.2016.03.037

Author Information

Name

Institution

Helsinki Institute of Physics

Helsinki Institute of Physics

University of Hamburg

Helsinki Institute of Physics

Helsinki Institute of Physics

Helsinki Institute of Physics

Helsinki Institute of Physics

Helsinki Institute of Physics

Helsinki Institute of Physics

University of Hamburg

University of Helsinki

University of Helsinki

Films

Plasma TiN using Beneq TFS-200

Deposition Temperature Range N/A

7550-45-0

7664-41-7

Thermal Al2O3 using Beneq TFS-200

Deposition Temperature Range N/A

75-24-1

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

811

Disclaimer

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