TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 69 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
2ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
3Annealing behavior of ferroelectric Si-doped HfO2 thin films
4Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
5Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
6Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
7Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
8Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
9Atomic layer deposition of titanium nitride from TDMAT precursor
10Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
11Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
12Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
13Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
14Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
15Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
16Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
17Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
18Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
19DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
20Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
21Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
22Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
23Fabrication and deformation of three-dimensional hollow ceramic nanostructures
24Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
25Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
26Fully CMOS-compatible titanium nitride nanoantennas
27High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
28Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
29Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
30Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
31Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
32Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
33Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
34Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
35Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
36Mechanical characterization of hollow ceramic nanolattices
37Microwave properties of superconducting atomic-layer deposited TiN films
38New materials for memristive switching
39NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
40Nitride memristors
41Non-destructive acoustic metrology and void detection in 3x50μm TSV
42Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
43Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
44Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
45Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
46Plasma Enhanced Atomic Layer Deposition on Powders
47Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
48Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
49Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
50Plasma-enhanced atomic layer deposition for plasmonic TiN
51Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
52Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
53Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
54Radical Enhanced Atomic Layer Deposition of Metals and Oxides
55Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
56Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
57Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
58Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
59Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
60Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
61Silicon nanowire networks for multi-stage thermoelectric modules
62Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
63Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
64Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
65Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
66Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
67TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
68Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
69Understanding and optimizing the floating body retention in FDSOI UTBOX

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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