Kensaku Kanomata Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Kensaku Kanomata returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
2Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
3RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
4Temperature-controlled atomic layer deposition of GaN using plasma-excited nitrogen source
5RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
6Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
7Room temperature atomic layer deposition of TiO2 on gold nanoparticles
8Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
9Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
10Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
11RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
12Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
13Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
14Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
15Infrared study on low temperature atomic layer deposition of GaN using trimethylgallium and plasma-excited ammonia
16Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH3