Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 48 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
3Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
4Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
5Breakdown and Protection of ALD Moisture Barrier Thin Films
6Comparative study of ALD SiO2 thin films for optical applications
7Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
8Composite materials and nanoporous thin layers made by atomic layer deposition
9Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
10Encapsulation method for atom probe tomography analysis of nanoparticles
11Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
12Fabrication and deformation of three-dimensional hollow ceramic nanostructures
13Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
14Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
15Gadolinium nitride films deposited using a PEALD based process
16Hafnia and alumina on sulphur passivated germanium
17High-efficiency embedded transmission grating
18High-Reflective Coatings For Ground and Space Based Applications
19Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
20Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
21Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
22Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
23Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
24Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
25Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
26Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
27Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
28Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
29Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
30Mechanical characterization of hollow ceramic nanolattices
31Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
32Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
33Method of Fabrication for Encapsulated Polarizing Resonant Gratings
34Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
35On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
36Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
37Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
38Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
39Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
40Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
41Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
42Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
43Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
44Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
45Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
46Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
47Trapped charge densities in Al2O3-based silicon surface passivation layers
48Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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