Microstructure Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Microstructure returned 53 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
2A route to low temperature growth of single crystal GaN on sapphire
3Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
4Atmospheric pressure plasma enhanced spatial ALD of silver
5Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
6Atomic layer deposition of GaN at low temperatures
7Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
8Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
9Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
10Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
11Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
12Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
13Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
14Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
15Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
16Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
17Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
18Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
19Gadolinium nitride films deposited using a PEALD based process
20Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
21Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
22HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
23Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
24In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
25Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
26Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
27Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
28Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
29Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
30Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
31Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
32Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
33Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
34Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
35Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
36Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
37Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
38Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
39Ru thin film grown on TaN by plasma enhanced atomic layer deposition
40Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
41Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
42Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
43Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
44Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
45Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
46TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
47Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
48The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
49The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
50The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
51Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
52Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
53Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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