Compositional Depth Profiling Plasma Enhanced Atomic Layer Deposition Publications

Your search for plasma enhanced atomic layer deposition publications discussing Compositional Depth Profiling returned 59 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
4Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
5Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
6Atomic layer deposition of titanium nitride from TDMAT precursor
7Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
8Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor
9Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
10Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
11Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
12Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
13Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
14Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
15Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
16Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
17Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
18Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
19Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
20Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
21Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
22Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
23Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
24Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
25Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
26Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
27Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
28Fully CMOS-compatible titanium nitride nanoantennas
29Gadolinium nitride films deposited using a PEALD based process
30GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
31Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
32Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
33Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
34Low temperature thin film transistors with hollow cathode plasma-assisted atomic layer deposition based GaN channels
35Low-Temperature Deposition of Hexagonal Boron Nitride Via Sequential Injection of Triethylboron and N2/H2 Plasma
36Optical and Electrical Properties of AlxTi1-xO Films
37Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
38Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
39Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
40Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
41Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
42Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
43Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
44Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
45Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
46Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
47Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
48Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
49Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
50TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
51The effects of layering in ferroelectric Si-doped HfO2 thin films
52The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
53The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
54The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
55Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
56Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
57Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
58Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
59Using top graphene layer as sacrificial protection during dielectric atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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