AlN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing AlN films returned 94 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
2A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
3ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
4AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
5AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
6AlN/GaN heterostructure TFTs with plasma enhanced atomic layer deposition of epitaxial AlN thin film
7Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
8Atomic Layer Deposition of AlN Thin Films in Three Different Growth Regimes
9Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
10Atomic layer epitaxy for quantum well nitride-based devices
11Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
12Characterization of SiNx/AlN passivation stack with epitaxial AlN grown on AlGaN/GaN heterojunctions by plasma-enhanced atomic layer deposition
13Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
14Comparative study on nitridation and oxidation plasma interface treatment for AlGaN/GaN MIS-HEMTs with AlN gate dielectric
15Comparison of ammonia plasma and AlN passivation by plasma-enhanced atomic layer deposition
16Compatibility of AlN/SiNx Passivation Technique with High-Temperature Process
17Compatibility of AlN/SiNx Passivation With LPCVD-SiNx Gate Dielectric in GaN-Based MIS-HEMT
18Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
19Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
20Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
21Crystalline growth of AlN thin films by atomic layer deposition
22Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
23Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
24Effects of interface oxidation on the transport behavior of the two-dimensional-electron-gas in AlGaN/GaN heterostructures by plasma-enhanced-atomic-layer-deposited AlN passivation
25Effects of rapid thermal annealing on the properties of AlN films deposited by PEALD on AlGaN/GaN heterostructures
26Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
27Engineered Tunneling Contacts with Low-Temperature Atomic Layer Deposition of AlN on GaN
28Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
29Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
30Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
31Fabrication of AlN/BN bishell hollow nanofibers by electrospinning and atomic layer deposition
32GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
33GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
34Gate Recessed Quasi-Normally OFF Al2O3/AlGaN/GaN MIS-HEMT With Low Threshold Voltage Hysteresis Using PEALD AlN Interfacial Passivation Layer
35Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
36Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
37Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
38High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
39High performance AlGaN/GaN HEMTs with AlN/SiNx passivation
40High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
41High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
42Hollow cathode plasma-assisted atomic layer deposition of crystalline AlN, GaN and AlxGa1-xN thin films at low temperatures
43Impact of AlN Interfacial Dipole on Effective Work Function of Ni and Band Alignment of Ni/HfO2/In0.53Ga0.47As Gate-Stack
44Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
45Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
46Improved Interface and Transport Properties of AlGaN/GaN MIS-HEMTs With PEALD-Grown AlN Gate Dielectric
47Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
48Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
49Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
50Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
51Low-temperature grown wurtzite InxGa1-xN thin films via hollow cathode plasma-assisted atomic layer deposition
52Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
53Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
54Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
55New materials for memristive switching
56Nitride memristors
57Optical characteristics of nanocrystalline AlxGa1-xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
58Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
59Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
60PEALD AlN: controlling growth and film crystallinity
61PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
62Performance enhancement of normally-off Al2O3/AlN/GaN MOS-Channel-HEMTs with an ALD-grown AlN interfacial layer
63Perspectives on future directions in III-N semiconductor research
64Plasma Enhanced Atomic Layer Deposition on Powders
65Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
66Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
67Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
68Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
69Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films
70Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
71Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
72Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
73Properties of AlN grown by plasma enhanced atomic layer deposition
74Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
75Radical Enhanced Atomic Layer Deposition of Metals and Oxides
76Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
77Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
78Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
79Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
80Silicon surface passivation with atomic layer deposited aluminum nitride
81Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
82Structural and optical characterization of low-temperature ALD crystalline AlN
83Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
84Study on the electrical characteristics of in situ PEALD-passivated HfO2/In0.53Ga0.47As MOSCAP and MOSFET structures
85Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
86Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
87Template-assisted synthesis of III-nitride and metal-oxide nano-heterostructures using low-temperature atomic layer deposition for energy, sensing, and catalysis applications (Presentation Recording)
88Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
89The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
90The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
91Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
92TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
93Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
94XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

Disclaimer

I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. I have hundreds of pre-2009 papers yet to add. As a result, the information provided is not perfect and not complete. Don't blame Plasma-ALD-Guy if the use of information on this site does not work out for you. If you know of publications I have missed or a database entry is wrong, send me an email at: plasma-ald-guy@plasma-ald.com

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